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27篇 您的检索式：作者名="RUNNELS S R"

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	题名	作者	年代	出处	被引量
1	Feature-scale fluid-based erosion modeling for chemical mechanical polishing显示文摘	Runnels S R	1994	Journal of Electrochemical Society1994，141，7：	2
2	Tribology analysis of chemical mechanical polishing显示文摘	Runnels S R Eyman L M	1994	Journal of Electrochemical Society1994，141，6：	2
3	Modeling the effect of polish pad deformation on wafer surface stress distributions during chemical-mechanical polishing显示文摘	Runnels S R Renteln P	1993	Dielect Sei Technol1993，6，：	1
4	Feature-scale fluid based erosion modeling for chemical-mechanical polishing显示文摘	S R Runnels	1994	J of the Electrochemical Society1994，141，7：	1
5	Tribology analysis of chemical-mechanical polishing显示文摘	S R Runnels L M Eyman	1994	J of the Electrochemical Society1994，141，6：	1
6	Tribology analysis of chemical- mechanical polishing 显示文摘	Runnels S R Eyman L M	1994	Electrochemical Society1994，141，6：	1
7	Tribology analysis of chemical-mechanical polishing显示文摘	RUNNELS S R EYMAN L M	1994	J Electrochem Soc1994，141，6：	1
8	Tribology Analysis of Chemical-Mechanical Polishing显示文摘	Runnels S R Eyman L M	1994	Journal of the Electrochemical Society1994，141，6：	1
9	Tribology analysis of chemical-mechanical Polishing显示文摘	S R Runnels	1994	J Of the Electrochemical Society1994，141，7：	1
10	Anaerobic metabolism of bacteria performing enhanced biological phos-phate removal显示文摘	HESSELMANN R P X VON RUNNELL R RESNICK S M	2000	Water Research2000，34，14：	1
11	显示文摘	Runnels S R	1994	J Electrochem Soc1994，141，7：	1
12	Effect of three-year consumption of erythritol, xylitol and sorbitol candies on various plaque and salivary caries related variables显示文摘	Runnel R Makinen K K Honkala S etal	2013	Journal of Den- tistry2013，41，12：	1
13	Tribology analysis of chemical-mechanical polishing 显示文摘	Runnels S R Eyman L M	1994	J Electrochemical Society1994，141，6：	1
14	显示文摘	Runnels S R	1994	J Electrochem Soc1994，141，7：	1
15	Tfibology analysis of chemical-mechanicalpolishing 显示文摘	Runnels S R Eyman L M	1994	J Electrochem Soc1994，141，：	1
16	Advances in Physically Based Erosion Simulators for CMP显示文摘	Runnels S R	1996	Journal of Electronic Materials1996，25，10：	1
17	Tribology Analysis of Chemical -Mechanical Polishing显示文摘	Runnels S R Eyman L M	1994	J Electrochem Soc1994，141，：	1
18	Tribology analysis of chemical mechanical polishing 显示文摘	Runnels S R Eyman L M	1994	Journal of the Electrochemical Society1994，141，6：	1
19	Tribology Analysis of Chemical-Mechanical Polishing显示文摘	Runnels S R Eyman L M	1994	J Electrochem Soc1994，141，6：	1
20	Tribology analysis of chemicalmechanicl polishing显示文摘	RUNNEL S R EYMAN L M	1994	Electrochem Soc1994，141，6：	1

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